换句话说，所需要的能量是不一样的，把所有原子或分子，蒸发到气相。
In other words, if you say, now let's think of the energy it would take to evaporate all the atoms or molecules and let them loose in the gas phase.
本文用气相色谱测定了多种烷烃、芳烃、醇类和酯类的蒸发热。
The heat of evaporation for various kinds of alkanes, alcohols, esters and aromatics were determined by gas chromatography.
已经有几种方法用于制备FTO薄膜，包括气相沉积法（CVD）、溅射、热蒸发法、溶胶凝胶法。
Several methods are used in preparation of FTO, which include chemical vapour deposition (CVD), sputtering, thermal evaporation and sol-gel technique.
简要概述了脉冲激光蒸发淀积(PLED)和激光诱导化学气相淀积(LCVD)的基本原理、淀积系统和激光器。
The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
该液相模型与有关的气相和相平衡模型耦合，可用于预测多组分液滴的蒸发过程。
Coupled with relevant gas-phase model and phase-equilibrium model, the model proposed can be used for prediction of multicomponent droplet vaporization process.
本文获得了液雾在过热蒸发状态下的液气两相能量方程，给合运动学方程、粒径分布及轨道模型，组成了描述液雾的完整数学方程组。
This paper describes the mechanism of water-spray flow and evaporation in high temperature gas under the condition of large liquid-gas ratio.
储存过程中LNG的气液两相组成和热力学性质一直随着液体的蒸发而不断变化的，模拟计算时需要对LNG热物性进行计算。
Composition and thermodynamics character of LNG vapor and liquid vary as liquid's vaporizing, so LNG physical characteristic must be calculated in the simulate process.
本课题利用化学气相沉积(CVD)和热蒸发法在硅片称底和多孔氧化铝(aao)模板上制备纳米硅线。
Silicon nano-wires (SiNWs) were fabricated on Anodized Aluminum Oxide (AAO) template and silicon chips by the Chemical vapor Deposition (CVD) and thermal evaporation method.
设计并制作了一套具有真空蒸发沉积和化学气相沉积两种薄膜制备功能的系统。
A new thin film preparation system has been devised and assembled. The system owns two kinds of thin film preparation function.
设计并制作了一套具有真空蒸发沉积和化学气相沉积两种薄膜制备功能的系统。
A new thin film preparation system has been devised and assembled. The system owns two kinds of thin film preparation function.
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