介绍了以DX -3扫描电镜为基础，利用SDS -2电子束扫描系统改装其偏转系统。
The deflection system of DX 3 has been rebuilt with SDS 2 system.
以明确的物理意义详细分析和讨论聚焦、扩束准直、扫描显示等光学系统的设计。
Design of optical system for the focusing, the collimating and the scanning is analysed and is discussed with precise physical meaning.
该系统使用了介质分束片，可以方便地进行散射角扫描。
Dielectric beam splitter was employed in this system, which facilitates the scan of scattering Angle.
从理论上研究了在主动型栅扫描束流配送系统下，靶体运动对靶区剂量均匀性以及重离子治疗适形程度的影响。
The influences of target motion on dose homogeneity and conformity degree were theoretically studied under the condition of the active raster-scanning beam delivery system.
为实现电子束曝光机扫描场的线性畸变校正，设计了图形发生器的成像系统，该系统包括硬件和软件两部分。
An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.
这种高压束阵式自动清洗系统比方阵扫描式提高清洗效率6 ~7倍。
Cleaning efficiency of the high-pressure beam formation automat - IC cleaning system is 6 ~ 7 times increase than the square scanning.
利用该系统可对电子束扫描轨迹、扫描频率以及加热区域电子束能量密度的分配进行离线编辑和在线调节。
The EB scanning track, scanning frequency and energy density distribution at heating zone could be programmed off-line and adjusted on-line.
电子束曝光机的偏转系统控制电子束偏转扫描。
The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
电子束曝光机的偏转系统控制电子束偏转扫描。
The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
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