结果表明：电火花线切割单晶硅损伤层主要由杂质元素重污染层、重熔层和含有高密度位错的弹性畸变层组成；
The results show that the damaged layer of silicon cut by WEDM mainly appears massive impurity elements, remelted and elastic distortion with a high density dislocation.
试样的表面应光滑，无外来杂质及损伤。成品应经打磨后裁制成相应尺寸。
The surface should be smooth, no foreign impurities and injury. The finished products should be polished after the cut into the appropriate size.
采用防静电处理的聚酯薄膜作为基材，具有防止灰尘和杂质吸附以及防止静电损伤功能的表面保护材料。
Adopted antistatic processing of polyester film is made as base material, it has prevent dirt and impurities adsorption and prevent electrostatic damage function of surface protective materials.
结果显示，杂质元素的含量偏高和沿晶界的偏析以及不均匀的钨晶粒是造成国产钨靶表面损伤的主要原因。
The results show that high content of impurity elements, segregation along grain boundaries and uneven grain size are main reasons for the surface damage of domestic tungsten targets.
从杂质气化的角度，应用弹性力学的球壳受压膨胀模型，分析薄膜表面鼓包的形成机制，同时得到了相应情况下薄膜的损伤机制。
From the point of gasification of impurity, we have analyzed the formation mechanism of bubbles in the surface of films using model of a spherical shell which endures high inner pressure.
室温下使用维氏硬度计研究了硅单晶表面的接触损伤及硅单晶中杂质对表面损伤的影响。
The contact damage and fracture property of silicon single crystal are investigated at room temperature by indentation, as well as the influence of the intended and unintended impurities.
结果显示，杂质元素的含量偏高和沿晶界的偏析以及不均匀的钨晶粒是造成国产钨靶表面损伤的主要原因。
The results show that high content of impurity elements, segregation along grain boundaries and uneven grain size are main reasons for the surface damage of domestic tung...
结果显示，杂质元素的含量偏高和沿晶界的偏析以及不均匀的钨晶粒是造成国产钨靶表面损伤的主要原因。
The results show that high content of impurity elements, segregation along grain boundaries and uneven grain size are main reasons for the surface damage of domestic tung...
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