采用无电镀沉积技术在经过机械抛光的单晶硅衬底上沉积了铜纳米晶。
Copper nanocrystallites were deposited on mechanically polished single crystal silicon (sc-Si) wafers by electroless deposition method.
结果表明经过化学机械抛光随后再经腐蚀后的蓝宝石衬底的表面性能最好。
The results show that the surface properties of it with CMP, and then chemically etching are best.
结果表明经过化学机械抛光随后再经腐蚀后的蓝宝石衬底的表面性能最好。
The results show that the surface properties of it with CMP, and then chemically etching are best.
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