对阿基米德螺旋线调制斩波器的曝光效率进行了理论分析和数值模拟，得到斩波器曝光效率对后续信号处理的影响。
The Archimedes spiral cord modulating chopper's exposure efficiency was theoretically analyzed and numerical simulated, and its impact on the following signal processing was obtained.
在电子束曝光胶图形的三维显影模拟工作中，首次使用了最精确的三维线踪模型。
The most accurate ray-tracing model is used firstly on the development simulation of resist exposed by electron beam.
用计算机模拟了制作菲涅耳透镜时灰度掩模的曝光量分布和菲涅耳透镜的面形结构。
We simulated the light exposure distribution of the mask and structure of the Fresnel lens in computer.
在相机拍照曝光时间内，尺形分辨率板运动至平行光管的视场内，以模拟无限远动态目标。
The dynamic object should arrive at the view field of the collimator in the camera exposure time to simulate infinity object.
因此，可以通过模拟结果得到不同厚度光刻胶的最佳曝光剂量，以便得到高质量的微结构图形。
The good agreement between the experimental and theoretical results allows to get the high pattern transfer accuracy microstructure through optimizing exposure dose for different resist thicknesses.
数值模拟的结果表明：合理选择光辐射波长、辐射曝光时间和曝光剂量，可以选择性的热破坏光老化皮肤中的病损组织。
The results of numerical simulation show the lesion of photoaging skin can be selectively damaged if the wavelength, exposure duration and exposure dose of irradiated ligh are reasonably selected.
根据平面区域变换的原理，导出电子束曝光机扫描场的畸变校正函数，并给出计算机模拟校正的结果。
A scan field distortion correction function fore-beam exposure system is deduced on the basis of the plane field alternation principle, and a simulative fruit is given by computer.
作为实例，给出了作者设计的两个典型的曝光系统光照分布的计算模拟结果。
As examples, the calculating simulation results of two typical systems designed by authors recently are given.
本文的模拟结果不仅能为高能电子束光刻工艺优化曝光条件、降低邻近效应提供理论指导，而且能为进一步的邻近效应的校正提供更精确的数据。
The present results not only can help to optimize the exposure conditions in Electron Beam Lithography, but also supply more accurate data for proximity effect correction.
本文的模拟结果不仅能为高能电子束光刻工艺优化曝光条件、降低邻近效应提供理论指导，而且能为进一步的邻近效应的校正提供更精确的数据。
The present results not only can help to optimize the exposure conditions in Electron Beam Lithography, but also supply more accurate data for proximity effect correction.
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