通过仿真与试验，设计了脉冲固体激光掩膜加工器的电源电路及控制系统，并详细地分析了它的工作原理。
Then the pulsed solid state laser power and mask machining system is designed through simulations and experiments. And the system working theory is also analyzed.
最后，采用各项异性的离子束(IBM)加工技术可以通过掩膜来蚀刻孔阵，以制成纳米多孔金属材料。
Last, a technique known as anisotropic ion beam milling (IBM) is used to etch through the mask to make an array of holes, creating the nanoporous metal.
介绍了飞秒激光加工光电倍增管电极，修复光刻掩膜，诱导白炽灯丝阵列微孔等一些工业应用。
Some industrial applications including micromachining dynodes of photomultipliers, repairing photomask of lithography, fabricating array micro-holes in incandescent filaments, etc. are introduced.
第三章给出了等截面悬臂梁微开关的微机械加工工艺，设计了掩膜版及具体的工艺参数。
Chapter three: Presents the fabrication process of micro-switch with cantilever beam and designed the masks.
光掩膜是半导体和精密加工的必要成分。
A photomask is an essential component for semiconductor manufacturing and microfabrication.
光掩膜是半导体和精密加工的必要成分。
A photomask is an essential component for semiconductor manufacturing and microfabrication.
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