给出了该掩模设计制作工艺过程及深x射线光刻结果。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
基于基尔霍夫标量衍射理论，采用光线追迹法设计了连续型平面衍射聚光透镜掩模。
According to Kirchhoff's scalar diffraction theory, with the ray tracing method, a continuous relief mask for diffractive focus lens has been designed.
实验结果表明该方法对复杂相移掩模的设计有效，可以减小邻近效应。
The experiment results show that the method is effective to devise complex phase? Shifting masks and the proximity effect is decreased.
该工具可以产生用于特定设计的制造掩模，该设计包括具有优化的阈值电压的混合栅极晶体管以符合电路设计标准。
The tool may generate fabrication masks for the given design that include mixed gate transistors with threshold voltages optimized to meet circuit design criteria.
利用光全息学的基本原理，设计了记录全息取样光栅掩模的消像差光学系统，并使用光学设计软件ZEMAX分析了它的像差；
By use of optical holographic theory, achromatic optical system on recording holographic BSG mask is designed. Its aberration is analyzed by using ZEMAX.
本文对大功率可控硅的阻断电压问题、正向压降问题、光刻掩模板的设计问题、控制极特性问题以及动特性问题进行了分析。
This paper analyses the blocking voltage, forward voltage drop, photoresist mask design and gate-triggering and dynamic characteristics of high-power thyristors.
此外，栅格大小与制造设计掩模的最小化电子束点大小成比例。
Additionally, the grid size is proportional to the minimum electron-beam-spot size used to create the masks for the design.
在制作阵列位相环元件的过程中，首先根据计算设计的数据，使用专业软件LEDIT绘制了两块掩模版的图形并制作完成。
In the production process, First of all, according to calculations, using professional software LEDIT to draw the two mask graphics and produced.
在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。
The mask design and the wet etching are both key processes in the technology introduced.
在整套工艺环节中，光掩模版图设计和湿法腐蚀是两个关键步骤。
The mask design and the wet etching are both key processes in the technology introduced.
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