从基材上除去掩模材料，在基材上形成功能材料的图案。
The mask material is removed from the substrate, forming the pattern of functional material on the substrate.
接着用填充材料填入掩模图案周围的间隔形成填料塞。
A filler material is next used to fill in the space around the masking patterns and to form filler plugs.
该方法使用具有浮雕结构的压模，将掩模材料转移至基材并在基材上形成敞开区域的图案。
The method USES a stamp having a relief structure to transfer a mask material to a substrate and form a pattern of open area on the substrate.
该方法使用具有浮雕结构的压模，将掩模材料转移至基材并在基材上形成敞开区域的图案。
The method USES a stamp having a relief structure to transfer a mask material to a substrate and form a pattern of open area on the substrate.
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