接着用填充材料填入掩模图案周围的间隔形成填料塞。
A filler material is next used to fill in the space around the masking patterns and to form filler plugs.
图中间的透镜起缩小掩模图案的作用，使得在晶圆上得到的电路图案长度上是掩模的四分之一。
A lens (middle) reduces the mask's image. So what gets printed on the wafer is typically four times smaller linearly than the mask's pattern.
同时限制在掩模图案的光刻增加步骤以三个或更少，甚至没有施加的MTP规格为写入时间提高了新工艺的性能。
Applying MTP specifications for write times improves the new process's performance while limiting increased steps in mask pattern lithography to three or fewer, and even none.
一种掩模的布图方法，包括为一层建立虚设图案抑制区域和单一类型的虚设图案。
A layout method for a mask includes creating dummy pattern inhibiting regions and a single dummy pattern type for a layer.
从基材上除去掩模材料，在基材上形成功能材料的图案。
The mask material is removed from the substrate, forming the pattern of functional material on the substrate.
该方法使用具有浮雕结构的压模，将掩模材料转移至基材并在基材上形成敞开区域的图案。
The method USES a stamp having a relief structure to transfer a mask material to a substrate and form a pattern of open area on the substrate.
一种彩色滤光片基板及图案化掩模。
The invention discloses a colored filter-sheet substrate and a patterning mask.
继之，以图案化灰化层为掩模，来图案化材料层。
The material layer is then patterned using the patterned ashable layer as a mask.
以及将所述第二图案组中的图案转印到所述双图案掩模组的第二掩模。
All patterns in the standard cells having the second indicator are transferred to a second mask of the double patterning mask set.
此时，进一步设置与该天线图案具有相同形状的掩模件。
At this time, a mask member having the same shape as that of the antenna pattern is further provided.
此时，进一步设置与该天线图案具有相同形状的掩模件。
At this time, a mask member having the same shape as that of the antenna pattern is further provided.
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