掩模只读存储器是一种只读存储器。
提供比GIMP内置的锐化掩模更好的效果。
Provides better results than Unsharp masking which is built into GIMP.
实现掩模图形的数字化输出。
通过掩模蒸铝形成顶部电极。
裁剪图像不使用图像掩模？
灰度掩模法是一种新的二元光学器件制做方法。
Gray scale mask method is a novel way of fabricating binary optical elements.
实现了用远场掩模法对单模光纤模场直径的测量。
Therefore, measurement of mode field diameter of single mode fibers by far-field mask is realized.
光线引入器采用了MEMS工艺的掩模板制备工艺。
利用显微视觉技术对光掩模的特征尺寸进行了测量。
In this paper, micro vision was used to make measurements on the feature size of photomask.
这一金属镀层过程对铬掩模塑料有非常广泛的作用。
The metalization process is used to chrome plate plastic for a variety of USES.
一种孔眼掩模组件包括可旋转机架和具有孔眼的掩模。
An aperture mask assembly includes a rotatable frame and a mask having apertures.
我参考了一些经典的指纹增强算法，如非锐化掩模等。
I referred some classic algorithms on fingerprint enhancement, such as the fingerprint enhancement by the unsharp masking.
刻写机可以根据该掩模板加工文件加工出需要的掩模板。
Then the writing machine is able to fabricate such a mask with this kind of file.
电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
Electron beam lithography machine is the key instrument for mask making and research of nanometer device.
氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。
A small undesired hole in an oxide opaque region of a mask or reticle or in a photoresist layer.
实验结果表明该方法对复杂相移掩模的设计有效，可以减小邻近效应。
The experiment results show that the method is effective to devise complex phase? Shifting masks and the proximity effect is decreased.
本文研究了一种新的混沌同步方法并将该方法应用于混沌掩模保密通信。
The author researches on a novel chaos synchronization method and its application to chaos secure communication system in this paper.
本文提出一种用一块单极性掩模板表示双极性互连矩阵的偏振编码方法。
A polarization coding method representing the bipolar interconnection by using a single bipolarized mask is proposed.
掩模制造掩模编程rom方法，装置，计算机编程产品，可读存储介质。
Method and device for making mask programming ROM, computer programmed product, ready-read storage medium.
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
提出一种基于硅工艺和双面对准技术的LIGA掩模技术，工艺十分简单。
LIGA mask technology based on silicon process technique and double side alignment is presented. The processing technology is simple.
论述了边缘相移掩模的原理、制作方法和工艺步骤，并给出了一些实验结果。
The principle, making method, technology and procedure for the rim phase shifting mask are described. Some experimental results are given.
在选择掩模平滑算法中，需要计算一幅图像的大量局部窗口的灰度均值和方差。
In selective masking smoothing algorithm, it is needed to calculate grayscale average and variance of a large number of image Windows.
采用相位掩模版法实验研究了高非线性掺锗光子晶体光纤中布拉格光栅的制作。
Fabrication of the Bragg grating in a highly nonlinear photonic crystal fiber was investigated experimentally by phase mask method.
一种掩模的布图方法，包括为一层建立虚设图案抑制区域和单一类型的虚设图案。
A layout method for a mask includes creating dummy pattern inhibiting regions and a single dummy pattern type for a layer.
提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。
Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
数字掩模技术的核心器件是数字微镜芯片，它具有较高的分辨率和灰度等级等优点。
DMD chip is the core device of digital mask technology, and it has such advantages as high resolve, gray level, and so on.
介绍了LIGA加工工艺以及多层掩模技术、复制技术、外形磨削成型技术的现状。
LIGA process and the actualities of multiple masks technology, replication technology and contour polishing technology are introduced.
介绍了LIGA加工工艺以及多层掩模技术、复制技术、外形磨削成型技术的现状。
LIGA process and the actualities of multiple masks technology, replication technology and contour polishing technology are introduced.
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