主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。
The principle and control algorithm of temperature compensation for Sub Micron projection lithography objectives are introduced.
偏光立体显示仪主要包括三部分，投影物镜系统、聚光系统、光源。
The stereo projector by polarized light include chiefly. the three parts: the objective lens system of the projection, the condensing system and a source of light.
对两种主要的光刻投影物镜安装方式进行了研究，并对各自特点进行了讨论。
Two main installation methods of lithography projection lens were studied in this paper, and their characteristics were discussed.
讨论远心投影物镜像差和CCD节距的关系，给出远心投影物镜校正像差的依据。
The relation between aberrations of the telecentric projection objective and the pitch CCD is discussed. The criterion of correcting aberrations in the telecentric projection objective is also given.
详细分析了该技术利用镜像测试标记检测投影物镜最佳焦面热漂移与放大倍率热漂移的基本原理。
The principle for measuring the thermal drifts of focus and magnification (TDFM) based on mirror-symmetry marks is described in this paper.
本文提出了一种可用于集成电路装配和质量控制的、带有双投影物镜和全息光学元件散射全息屏幕的投影型全息显微镜（PHM）系统。
A projection-type holographic microscope with double projection-objectives and a holographic screen used for integrated circuits assembly and quality control is described.
在高数值孔径、低工艺因子的光刻技术中，投影物镜彗差对光刻质量的影响变得越来越突出，因而需要一种快速、高精度的彗差原位测量技术。
In high numerical aperture and low technic factor lithography process, degradation of the image quality because of the coma aberration in the projection lens has become a serious problem.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
大视场投影光刻物镜是光学系统中的一种特殊的形式，其设计加工要求高。
The large field projection lithography lens is a special optical lenses form, which put an high demands on the design and processing both for mechanical and optical.
整个光学系统采用锗和硅两种材料，包含11片透镜，其中：准直物镜3片，投影镜头7片，场镜1片。
The whole optical system using the materials of Ge and si consisted of 11 elements, including 3 lenses for collimator and 7 lenses for the projection system.
不同需要可选用不同的物镜，例如，投影物体轮廓和外形的投影仪，物镜应较好地矫正畸变和像场弯曲；
For example, Projection objects profile and appearance of the projector. The objective should be better correction distortion and like a crooked.
不同需要可选用不同的物镜，例如，投影物体轮廓和外形的投影仪，物镜应较好地矫正畸变和像场弯曲；
For example, Projection objects profile and appearance of the projector. The objective should be better correction distortion and like a crooked.
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