实验结果表明该方法可以高精度、有效地获得投影光刻机像质校正灵敏矩阵。
Experiment results show that the image quality correction sensitive matrix can be obtained in situ by this method with a high accuracy.
本文从最基本的角度出发，介绍了亚微米分步重复投影光刻机中的一项新的检测技术——基准校正技术。
A new detecting technique-correction technique for datum in submicron DSW is introduced from the basic point of view.
本文从投影光刻机的图形传递要求出发，导出投影光刻机各主要光学系统的具体要求，并讨论这些参数确定的局限性。
The specific parameters of main optical system are deduced from the requirement of pattern transfer for the projection aligner. The limit of these parameters is discussed.
随着光刻特征尺寸的不断减小，尤其是随着分辨力增强技术的使用，像质参数的原位检测已成为先进的投影光刻机中不可或缺的功能。
As feature size shrinks, especially with the use of resolution enhancement techniques, accurate measurement of image quality parameters in situ is indispensable for the lithographic tools.
随着光刻特征尺寸的不断减小，尤其是随着分辨力增强技术的使用，像质参数的原位检测已成为先进的投影光刻机中不可或缺的功能。
As feature size shrinks, especially with the use of resolution enhancement techniques, accurate measurement of image quality parameters in situ is indispensable for the lithographic tools.
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