带喷流再入假目标是战略导弹弹头突防的一种重要手段，电子密度及其分布是等离子体发生器实现飞行器隐身的关键。
Reentry bait with cascade is an important means of strategic missile-warhead penetration . Eletron consistence and their distribution is the sticking point of the plasm production implement.
带喷流再入假目标是战略导弹弹头突防的一种重要手段，电子密度及其分布是等离子体发生器实现飞行器隐身的关键。
Reentry bait with cascade is an important means of strategic missile-warhead penetration . Eletron consistence and their distribution is the sticking point of the plasm production implement.
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