采用感应耦合等离子体刻蚀技术实现了不同形状和几何参数的规则织构化硅片表面的构筑与制备。
Regular textured silicon surfaces with various shape and different geometrical parameters were successfully designed and prepared using inductively coupled plasma (ICP) etching technology.
利用电子束光刻、等离子体增强化学气相沉积、感应耦合等离子体刻蚀来实现跑道型微环谐振器的制备；
The optical part can be done by applying Electron Beam Lithography (EBL), Inductively Coupled Plasma (ICP) etching, and Plasma-enhanced Chemical Vapor Deposition (PECVD).
原子谱线和离子谱线特性分析表明，在鞘层附近区域感应耦合等离子体具有较高的离子密度和较低的电子温度。
It was shown that the ion density is higher and the electron temperature is lower in the vicinity of inductively coupled plasma sheath according to the ionic line and atomic line.
感应耦合等离子体触角安装在介电窗上以便定位在介电窗的中心上，并且将来自射频电源的射频功率传输到加工室内部。
An inductively coupled plasma antenna, which is installed on a center of the dielectric window, transfers radio frequency power from an RF power supply to the interior of the processing chamber.
本文介绍一种用于感应耦合等离子体-原子发射光谱法的钽舟电热蒸发进样装置，介绍了该装置的电路设计、蒸发室系统。
The electric system and evaporation chamber of a tantalum capsule electrothermal evaporation sample introduction device for ICP-AES are described.
本文提出了一种新的利用发射光谱测量感应耦合氮等离子体的电子温度的诊断方法。
A new diagnostic method using optical emission spectroscopy to determine electron temperature in inductively coupled nitrogen plasma is proposed.
本文提出了一种新的利用发射光谱测量感应耦合氮等离子体的电子温度的诊断方法。
A new diagnostic method using optical emission spectroscopy to determine electron temperature in inductively coupled nitrogen plasma is proposed.
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