另外，还披露了用于制造这种介质的方法，例如倾斜溅射或选择性蚀刻。
Further methods for manufacturing such a medium are described, e. g. inclined sputtering or selective etching.
但是他们所提供的是清晰度和可读性，对比度则乏善可陈：其效果相当灰暗，就像蚀刻素描。
But what they offer in clarity and readability, they lack in contrast: Their look is decidedly gray, like an etch a Sketch.
纳米电子蚀刻素描可以通过施加负电压，对画好的线路进行选择性清除。 他们的成果刊登在去年出版的《科学》杂志上。
Not so with the nanoelectric Etch A Sketch, which can selectively erase the conducting lines it creates by applying negative voltage.
阻剂：用来选择性保护某图形区域免受蚀刻剂，焊料或电镀影响的涂层材料。
Resist: coating material used to mask or to protect selected areas of a pattern from the action of an etchant solder or plating.
由于它的优点，如高蚀刻率、高选择性、无碳蚀刻和最小限度的残留污染，电子工业把它用在等离子和热清洁应用中。
The electronics industry uses it in plasma and thermal cleaning applications for its advantages such as high etch rates, high selectivity, carbon-free etching, and minimal residual contamination.
研究采用化学蚀刻聚酰亚胺的方法来制作双面连接的单面挠性板，以满足精细手指的尺寸和位置精度的要求。
In the study, in order to get good precision of dimension and position of fine leads, chemical etching method is used to make high density double assess single-sided FPC.
氮化硅蚀刻槽为您提供无与伦比的过程控制、安全性和灵活性。
The Modutek Nb Series silicon nitride bath is engineered to provide unparalleled process control, safety, and flexibility.
该树脂组合物是可以用于光纳米印制的低粘度而干蚀刻性优异的光固化 性树脂。
This low-viscosity photocurable resin composition has excellent dry etching resistance and is applicable to optical nanoprinting.
在微带线等传输线地平面上蚀刻的DGS作为一种周期性结构，其构造非常简单、性能优越、而且易于设计和实现。
The DGS on the ground plane of transmission line is of simple structure and excellent performance and is easy to realize.
基于差动原理对HF酸恒定化学蚀刻速率法进行改进，以降低环境(温度、HF酸浓度等)变化对测量结果的影响，从而提高测量效率和测量准确性。
Constancy of chemical etch rate method was modified so as to reduce the influencing factors such as temperature and concentration of HF acid. The efficiency and accuracy are improved.
所述植入物的生物相容性金属表面在施加电流的电解质溶液中进行电化学蚀刻。
The biocompatible metal surface of the implant is submitted to electrochemical etching in an electrolyte to which an electric current is applied.
双短手柄和弹簧行动蚀刻标识锁的结构性袋。
Structured bag with double short handles and a spring-action etched logo lock.
采用现代蚀刻工艺制作而成，极富装饰性，使用环境为卫浴间。
It is made by modern etching and full of decoration and used in bathroom.
该创造性的轮廓既允许通过热氧化来均匀地生长氧化物层，并且也允许结构的基本均匀的蚀刻速率。
The inventive profile allows for both the uniform growth of oxide layers by thermal oxidation, and substantially uniform etching rates of the structures.
本发明的课题在于提供一种耐折性、蚀刻特性、与抗蚀剂的粘合性优异、没有表面缺陷的两层挠性基板。
The invention provides a two-layer flexible substrate which is free from surface defects, while being excellent in flexural strength, etching characteristics and adhesion to a resist.
本发明的课题在于提供一种耐折性、蚀刻特性、与抗蚀剂的粘合性优异、没有表面缺陷的两层挠性基板。
The invention provides a two-layer flexible substrate which is free from surface defects, while being excellent in flexural strength, etching characteristics and adhesion to a resist.
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