热敏薄膜电阻制备是非致冷微测辐射热计红外焦平面的一项关键技术。
Preparation of thermal sensitive thin film resistor is one of key technologies in uncooled micro bolometer IR FPA fabrication.
微测辐射热计fpa的热设计是非致冷红外探测器设计的难点和关键。
The thermal design of the microbolometer FPA is a difficulty and key problem when an uncooled infrared microbolometer detector is designed.
非致冷微测辐射热计具有较大不均匀性，并且输出响应受衬底温度影响很大。
The output responsivity of uncooled microbolometer is nonuniform, and greatly influenced by the substrate temperature.
由于非均匀性校正的局限性，以前的微测辐射热计需要对基底温度进行精确控制。
Because of the limitation of non uniformity correction, former microbolometer needed to control substrate temperature accurately.
对目前在非致冷微测辐射热计研制中得到成功应用的氧化钒薄膜的特性、制备及表征技术进行综述。
The properties, preparation and characteristics of vanadium oxide thin film, which has been successfully used in un cooled micro bolometer fabrication, are reviewed.
选定多形硅薄膜为微测辐射热计热敏层，并重点从光学和热学两方面对微测辐射热计结构进行了优化设计。
Polymorphous silicon film was selected to be thermal-resistance layer of micro-bolometer, and we optimized the structure of micro-bolometer through optical and thermal design.
通过改善结构，来研制更小尺寸、更高分辨率的器件，成为微测辐射热计研制的新趋势，而其中最普遍的做法就是使用双牺牲层。
In order to develop high resolution uncooled infrared microbolometer with smaller pixel size, cell structure with double sacrificial layers is a new trend and the most common way for microbolometers.
利用有限元法对微桥结构的测辐射热计进行了二维热模拟。
Two-dimensional thermal simulations of the microbolometer with a micro-bridge structure by finite element method were done.
利用有限元法对微桥结构的测辐射热计进行了二维热模拟。
Two-dimensional thermal simulations of the microbolometer with a micro-bridge structure by finite element method were done.
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