介绍了连续微光学元件在光刻胶上的面形控制方法。
The method on profile - control of micro - optic element in photoresist was presented.
作为夜视技术的主要技术途径，微光夜视和红外热成像技术在现代战争中具有重要的地位，掌握先进的夜视技术对于控制战场形势至关重要。
As main technological approaches of night vision technology, low_light level night vision and infrared thermal imaging have played important roles in modern war.
通过对光刻工艺过程的研究，可为较好地控制正性光刻胶面形，制作微机械、微光学器件提供了参考依据，对微浮雕结构的深刻蚀具有重要的指导意义。
We can better control the positive photoresist figure, provide a reference for making MEMS and MOEMS, it is of an important instructional significance for deep relief of micro structure.
此特性使得该类抗蚀剂可用于微光学元件加工，并可对其表面形状进行控制。
This property provides a controlling of surface profile of micro(optical) elements fabricated with photoresists.
样机已通过外场试验证实了其目标发现距离远大于传统的微光夜视仪。本文还重点介绍了与该夜视仪相配合的云台控制系统。
Outfield experiments have confirmed that the target discovered distance of sample devices is by far larger than traditional LLL night vision device.
样机已通过外场试验证实了其目标发现距离远大于传统的微光夜视仪。本文还重点介绍了与该夜视仪相配合的云台控制系统。
Outfield experiments have confirmed that the target discovered distance of sample devices is by far larger than traditional LLL night vision device.
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