介绍了调整扫描投影式光刻机畸变的几种方法。
Essay brief a few kind methods of correcting distortion of Scan Projection Mask Alignment System.
由于市场对尼康193 n m液浸式光刻工具的需求有所抬头,加上尼康lcd用步进光刻机业务情况相对稳定。
Demand is picking up for its 193-nm immersion tool. And its LCD stepper business is steady.
德国米铱公司提供的电容式位移传感器被用于以纳米级的精度校准芯片光刻机中镜片的位置,测量晶圆厚度等应用。
Capacitive sensors from Micro-Epsilon are used, among other things, for the positioning, displacement measurement and thickness measurement in the semiconductors area.
对深入理解和认识接近式深度光刻机的掩模-硅片间衍射的物理本质提供了更为方便的研究手段。
It provides more convenient research means for understand the physical essence of diffraction between mask and wafer of proximity deep stepper.
对深入理解和认识接近式深度光刻机的掩模-硅片间衍射的物理本质提供了更为方便的研究手段。
It provides more convenient research means for understand the physical essence of diffraction between mask and wafer of proximity deep stepper.
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