本发明提供一外延沉积工艺，其包含干式蚀刻工艺与后续的外延沉积工艺。
An epitaxial deposition process including a dry etch process, followed by an epitaxial deposition process is disclosed.
本发明提供一外延沉积工艺，其包含干式蚀刻工艺与后续的外延沉积工艺。
An epitaxial deposition process including a dry etch process, followed by an epitaxial deposition process is disclosed.
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