采用高压探头示波器系统研究了射频辉光放电参数对自偏压的影响规律。
Influence of discharge parameters such as RF power and working pressure on the negative self-bias voltage of substrate was investigated by an oscilloscope with a high voltage probe.
射频辉光放电等离子体在微电子及半导体薄膜材料生长等方面有着广泛的应用。
Plasma in radio frequency (rf) glow discharge is widely used in the preparation of semiconductor film materials and microelectronic industry.
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
用椭圆偏振光谱法研究了热处理对射频辉光放电淀积的氢化非晶碳膜光学性质的影响。
Using spectroscopic ellipsometry, the influence of thermal annealing on optical properties of the plasma-deposited hydrogenated amorphous carbon films is investigated.
分析比较了灯丝放电PIII和射频辉光放电PIII对基体表面进行氮离子注入后的改性效果。
Modification effect of hot filament gas discharge PIII was compared with that of radio-frequency (RF) glow discharge PIII.
本文首先对比研究了两种以氧气作为放电气体的等离子体：电感式射频辉光等离子体(RF)和介质阻挡放电等离子体(DBD)氧化纳米炭黑的工艺。
Firstly, it was contrastively studied that the nanometer carbon black was oxidized by two kind of oxygen plasma: radio frequency discharge (RF) and dielectric barrier discharge (DBD).
本文首先对比研究了两种以氧气作为放电气体的等离子体：电感式射频辉光等离子体(RF)和介质阻挡放电等离子体(DBD)氧化纳米炭黑的工艺。
Firstly, it was contrastively studied that the nanometer carbon black was oxidized by two kind of oxygen plasma: radio frequency discharge (RF) and dielectric barrier discharge (DBD).
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