• 另外有源之间隔离必须充当离子注入步骤一自行对准阻挡时,所述多晶硅瓦片本身增加所述隔离厚度

    In addition, the poly tiles themselves increase the thickness of the isolation between active silicon regions when it must serve as a self-aligned blocking layer for an ion implantation step.

    youdao

  • 另外有源之间隔离必须充当离子注入步骤一自行对准阻挡时,所述多晶硅瓦片本身增加所述隔离厚度

    In addition, the poly tiles themselves increase the thickness of the isolation between active silicon regions when it must serve as a self-aligned blocking layer for an ion implantation step.

    youdao

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