通过改善结构，来研制更小尺寸、更高分辨率的器件，成为微测辐射热计研制的新趋势，而其中最普遍的做法就是使用双牺牲层。
In order to develop high resolution uncooled infrared microbolometer with smaller pixel size, cell structure with double sacrificial layers is a new trend and the most common way for microbolometers.
通过改善结构，来研制更小尺寸、更高分辨率的器件，成为微测辐射热计研制的新趋势，而其中最普遍的做法就是使用双牺牲层。
In order to develop high resolution uncooled infrared microbolometer with smaller pixel size, cell structure with double sacrificial layers is a new trend and the most common way for microbolometers.
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