• 发明涉及I化合物及其药用活性盐,其中R1低级烷基苄基任选地被卤素或低级烷氧基取代;

    The present invention relates to compounds of formula (I) wherein R1 is hydrogen, lower alkyl or benzyl which may be optionally substituted by halogen or lower alkoxy;

    youdao

  • 发明涉及I化合物及其药用活性盐,其中R1低级烷基苄基任选地被卤素或低级烷氧基取代;

    The present invention relates to compounds of formula (I) wherein R1 is hydrogen, lower alkyl or benzyl which may be optionally substituted by halogen or lower alkoxy;

    youdao

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