屏蔽层的导电率是由连同半导电层所采用的金属带或线的截面积和电阻率所决定的。
Shielding layer conductivity is made together with the semiconductive layer adopts metal strip or wire cross-sectional area and the resistivity is determined by the.
屏蔽层的导电率是由连同半导电层所采用的金属带或线的截面积和电阻率所决定的。
Shielding layer conductivity is made together with the semiconductive layer adopts metal strip or wire cross-sectional area and the resistivity is determined by the.
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