用氢气、丙酮蒸汽为源气体，通过微波增强的化学气相沉积方法，实现了在金刚石表面气相外延生长单晶金刚石薄膜。
Vapour epitaxial grown single-crystal diamond film on diamond surface was obtained by microwave reinforced chemical vapour deposition method, using hydrogen, aceton vapour as source of gas.
其安装场所无严重影响变压器绝缘的气体蒸汽、化学沉积、灰尘、灰垢及其他爆炸和腐蚀性介质。
Working environnment should be without gas, steam, chemical deposition, dust or dirt that will affect transformer's insulation seriously, also explosive or corrosive medium is not allowed.
结果表明，丙醇钽、丁醇钽和乙醇铌的蒸汽压大小能够满足化学气相沉积的要求，有足够的挥发速率。
The results show that the vapour pressure and the mass loss rate of tantalum propoxide, tantalum butoxide and niobium ethoxide are suited for chemical vapor deposition.
结果表明，丙醇钽、丁醇钽和乙醇铌的蒸汽压大小能够满足化学气相沉积的要求，有足够的挥发速率。
The results show that the vapour pressure and the mass loss rate of tantalum propoxide, tantalum butoxide and niobium ethoxide are suited for chemical vapor deposition.
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