通过深紫外光刻和感应耦合等离子刻蚀设备，制备了所设计的器件。

The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching.

youdao

目前，刻蚀技术已经成为集成电路生产中的标准技术，干法刻蚀设备亦成为关键设备。

Now etching has be-come the standard technology, and etching equipment is the key equipment in IC production.

youdao

目前，刻蚀技术已经成为集成电路生产中的标准技术，干法刻蚀设备亦成为关键设备。

Now etching has be-come the standard technology, and etching equipment is the key equipment in IC production.

youdao