探讨了用液相电解沉积法在钛合金表面制备类金刚石薄膜的新方法。讨论了不同沉积条件对膜的影响。
In this paper, Influence of deposition condition on diamond-like carbon(DLC) fil ms byliquid deposition onthe surface of Ti alloy was discussed.
采用真空磁过滤弧沉积(FAD)的方法制备的类金刚石(DLC)薄膜具有良好的场发射性能。
Diamond -like -carbon (DLC) thin film was prepared by filtered arc deposition (FAD) with a good electron emission performance.
本文通过实验表明采用电化学淀积法，选择合适的电解质溶液和制备工艺条件，可以在液相中获得类金刚石薄膜。
It is indicated that DLC films can be deposited in liquid phase by choosing appropriate electrolyte and preparing technology by electrodeposition method.
成功地用该设备制备出类金刚石薄膜。
文中还提出了在类金刚石薄膜进一步开发、研究及应用中仍需解决的一些工艺及技术问题，描述了制备大尺寸均匀性类金刚石薄膜的可行性方案。
The method for the drposition of large area and homogeneous DLC films is described. Problems faced with in the further development and application of the films are also discussed.
为了满足制备较厚低摩擦系数类金刚石薄膜（DLC）耐磨镀层的实际需求，对在等离子增强化学气相沉积的类金刚石薄膜（W-DLC）中掺钨进行了系统研究。
To meet the requirement for the diamond-like carbon thin films with low friction factor, the tungsten-doped diamond-like carbon(W-DLC)thin films prepared through PECVD were studied in depth.
为了满足制备较厚低摩擦系数类金刚石薄膜（DLC）耐磨镀层的实际需求，对在等离子增强化学气相沉积的类金刚石薄膜（W-DLC）中掺钨进行了系统研究。
To meet the requirement for the diamond-like carbon thin films with low friction factor, the tungsten-doped diamond-like carbon(W-DLC)thin films prepared through PECVD were studied in depth.
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