直接形成在基础基板上具有第一长度的支持图案，其维持与阵列基板均匀分隔距离；
The supporting pattern is formed on a base substrate with a first length, and maintains a separation distance from the array substrate.
直接形成在基础基板上具有第一长度的支持图案，其维持与阵列基板均匀分隔距离；
The supporting pattern is formed on a base substrate with a first length, and maintains a separation distance from the array substrate.
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