对薄层电阻、接触、光掩模对准、线条宽度、器件参数与掺杂的相关性等内容进行了初步试验和分析。
The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made.
LSI掩模图形的运算在版图分析和校验软件中占有重要的地位，而其中最核心的图形运算是布尔运算和拓扑分析。
The operations for LSI mask artwork play an important role in the mask artwork analysis and verification software. The core in these operations is the boolean operation and topological analysis.
本文分析了它的物理机制、掩模类型、编码过程、约束条件和优化方法。
The paper analyses the gray-tone mask physical mechanism, coding and optimum process.
利用光全息学的基本原理，设计了记录全息取样光栅掩模的消像差光学系统，并使用光学设计软件ZEMAX分析了它的像差；
By use of optical holographic theory, achromatic optical system on recording holographic BSG mask is designed. Its aberration is analyzed by using ZEMAX.
本文对大功率可控硅的阻断电压问题、正向压降问题、光刻掩模板的设计问题、控制极特性问题以及动特性问题进行了分析。
This paper analyses the blocking voltage, forward voltage drop, photoresist mask design and gate-triggering and dynamic characteristics of high-power thyristors.
对掩模法进行了公式推导及相关参数的分析确定，并对掩模法所能引起的误差进行了估算。
The derivation of formula and the analysis of related parameters are made for the mask method. The errors introduced by mask method are calculated.
分析了掩模孔间距、写入时间及入射角度等实验条件对写入光子晶格的影响。
The influences of the experimental conditions such as core spacing, writing time and incidence Angle were analyzed.
通过分析点扩散函数、斯特列比和离焦量的关系来评价三种不同掩模板对光学系统成像质量的影响。
Point spread function (PSF) and Strehl ratio (SR) are used to evaluate the imaging quality of the system with different defocus parameters.
通过分析点扩散函数、斯特列比和离焦量的关系来评价三种不同掩模板对光学系统成像质量的影响。
Point spread function (PSF) and Strehl ratio (SR) are used to evaluate the imaging quality of the system with different defocus parameters.
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