所述组合物可以施涂到硅片或其它基材上，形成开始时不溶于一般光致抗蚀剂显影溶液中的固化或硬化层。
The compositions can be applied to a silicon wafer or other substrate to form a cured or hardened layer which is initially insoluble in typical photoresist developing solutions.
所述组合物可以施涂到硅片或其它基材上，形成开始时不溶于一般光致抗蚀剂显影溶液中的固化或硬化层。
The compositions can be applied to a silicon wafer or other substrate to form a cured or hardened layer which is initially insoluble in typical photoresist developing solutions.
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