光致诱蚀作用或无显影气相光刻作用是一个非常有趣的现象。
The photo-induced etching effect, or development-free vapor photolithography is a very interesting phenomenon.
结果显示了在光致和电致激发下非晶碳化硅的发光和DBR 对光谱的限制增强作用。
The PL and EL spectra were recorded, which showed a-SiCx:H luminescence and DBR effect on the spectra.
法拉第磁光效应发生的物质基础是磁光介质，磁致旋光效应正是线偏光与该介质发生作用的结果。
The material base is magneto-optic material that Faraday magneto-optic effect brings about, which is the result that plane polarized light interact between magneto-optic material.
文章指出纯化s BS液体介质对于克服SBS过程中出现的光致破坏作用，自散焦等非线性效应是关键。
The author pointed out that purifying medium is essential to prevent from the breakdown due to powerful intensity, defocus and other nonlinear optical effects in the process of SBS.
结论：青蒿素可明显抑制uvb反复照射小鼠皮肤中c -kit和PAR - 2的表达，提示系统性应用青蒿素对UV B致小鼠皮肤光损伤有保护作用。
Conclusion: artemisinin can inhibit UVB-induced skin c-KIT and PAR-2 expression, which indicates that systemic use of artemisinin may prevent the damage of ultraviolet.
结论：青蒿素可明显抑制uvb反复照射小鼠皮肤中c -kit和PAR - 2的表达，提示系统性应用青蒿素对UV B致小鼠皮肤光损伤有保护作用。
Conclusion: artemisinin can inhibit UVB-induced skin c-KIT and PAR-2 expression, which indicates that systemic use of artemisinin may prevent the damage of ultraviolet.
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