在进行大规模集成电路光刻时，采用同步辐射光源是一项新技术。
It is an new technology to use synchrotron radiation lithograph for making large scale integral circuit.
传统光学光刻技术的高成本促使科学家去开发新的非光学方法，以取代集成电路工厂目前所用的工艺。
The high cost in traditional optics lithography drives the scientists to invent new non-optical methods to replace processes currently used in IC factories.
光刻校正技术已成为超深亚微米下集成电路设计和制造中关键的技术。
The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM.
该试剂用于清除匀胶后残留于硅片边缘及背面的光刻胶，已经广泛应用于中、大规模集成电路及其它半导体器件的生产。
The chemical is widely used in the production of LSI, VLSI and other semiconductors to remove photoresist edge bead that occurs during typical spin coat wafer processing.
光刻是大规模集成电路生产流程中十分关键的一环，而光刻中使用的掩模的质量对大规模集成电路的成品率有很大的影响。
In the manufacture process of integrated circuit (IC), lithography occupy a very important step, and the quality of photomask used in lithography affects the yield of LSI.
光刻是集成电路工艺中的关键性技术，其构想源自于印刷技术中的照相制版技术。
Lithography is the key technology in integrated circuit technology, the idea originated in printing technology in the photo lithographic process.
光刻是集成电路工艺中的关键性技术，其构想源自于印刷技术中的照相制版技术。
Lithography is the key technology in integrated circuit technology, the idea originated in printing technology in the photo lithographic process.
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