为了提高在激光直写设备中光刻系统的写入精度，对光探头调焦系统进行了研究。
To improve the precision of the laser direct writing device, researches have been done for the focusing servo system.
本文介绍制造回光栅所采用的一种新型接近式光刻系统的原理、结构和光刻性能。
In this paper, the principle, construction and function of a new near photolithography system for manufacturing circular gratings are introduced.
根据测量的树脂的特性值，使用实验室开发的微反射镜动态掩膜微立体光刻系统，成功制作微齿轮。
According to the two values, a micro-gear was fabricated by projection microstereolithography system using digital micro mirror dynamic mask.
阐述高分辨力光刻机的图像对准系统的原理及实现过程。
The principle and implementation of high precision video based alignment system are described.
本文重点讨论了曲面光刻的关键技术——自动调焦系统，并对曲面工艺及光刻线条进行实验分析。
The study of this dissertation analyses the focus system technology, which is the key technology of curve plane surface lithographic fabrication techniques.
本文从投影光刻机的图形传递要求出发，导出投影光刻机各主要光学系统的具体要求，并讨论这些参数确定的局限性。
The specific parameters of main optical system are deduced from the requirement of pattern transfer for the projection aligner. The limit of these parameters is discussed.
本文介绍了同步辐射光刻镜扫描控制系统。
In this paper a scanning mirror control system is introduced.
介绍投影光刻机设备的晶片传输系统中切边探测和晶片预对准技术。
Mostly introduction the of detection and the of prealignment technology of the Wafer Loader system in the Projection-Lithography equipment.
超精密气浮工件台系统是当前主流光刻机中的核心子系统，要求具有纳米级的重复定位精度和同步运动精度。
Stage system is one of the most important sub systems in a step and scanner, the accuracy of its positioning and synchronizing has reached nanometer level.
光刻装置，镜元件，器件制造方法，及束传送系统。
Photoetching device, mirror element, device producing method and beam transfering system.
提出了用于提高X射线光刻对准系统自动对准效率和对准精度的图像边缘增强技术，并进行了数值分析。
The image edge-enhanced technique was proposed to improve the automatic aligning efficiency and aligning accuracy in the X-ray lithography aligning system, and the numerical analysis was given.
晶圆处理系统是光刻机的重要组成子系统，其包含两个主要部分：晶圆传输系统和晶圆预对准系统。
The wafer processing system is an important subsystem of the lithography, which consists of a wafer transmission system and a wafer pre-alignment system.
介绍了光刻投影系统的组合集成，详细分析了该系统的成像特点及光学性能。
Integration of the system is described, the characteristics of the photolithographic imaging system are analyzed in detail.
对于大口径精密投影光刻制版镜头来说，透镜的应力变形和中心误差对整个系统的成像质量有较大影响。
For big aperture's precision photolithographic plate-making lenses, the stress distortion and centering errors of lenses can make a bad effect on imaging quality.
激光直写系统的应用，可以分成一次曝光制作光刻掩模和多次套刻曝光制作器件两个方面。
Mask making with one step exposure and device making with multiple overlay exposure are applications of the system.
提出了一种用于光刻装置的对准系统。
A novel alignment system is presented for lithographic apparatus.
介绍了一种基于线阵CCD的光刻机调焦调平系统，讨论了其检测和控制原理。
A focus and level system of stepper based on linear array CCD was introduced, its testing and controlling principles were discussed.
系统介绍了芯片实验室的各种制备技术，这些技术包括紫外光刻、软刻蚀、LIGA技术、DEM技术、键合等。
Some polymer materials are used as substrate. Kinds of new microfabrication technology are presented, including lithography, soft etching, LIGA, DEM and bonding, etc.
接近式光刻中一般采用柯勒照明系统，并采用蝇眼透镜形成多点光源均匀掩模面的光场分布。
Kohler illumination was used in proximity lithography, and a flys eye lens was adopted to form multi-point source in order to uniform the light intensity on the mask plane.
通过双远心成像光路，激光直写（LDW）系统SVG-LDW04把液晶空间光调制器（LCD-SLM）上的光斑直接成像在光刻胶板上，得到高质量的光斑图形。
The laser direct writing(LDW) system SVGLDW 04 with a projection optical system and a spatial light modulator(LCD-SLM) can expose a reduction pattern directly on a photoresist plate.
在简述双面光刻对准系统原理的基础上，着重论述了如何利用DSP进行图像采集与处理，以实现底面曝光的高精度对准。
After introducing the principle of bottom side alignment, how to using DSP to do im-age acquisition and processing is discussed.
硅片调焦调平测量系统测试平台用于对光刻机硅片调焦调平测量系统的性能进行检测。
The Test Bench built for Wafer Focusing and Leveling Sensor is to measure and evaluate its performance.
该系统可以在有间隙的情况下进行光刻，并通过实验给出了刻制不同宽度刻线时的间隙量大小。
This system is used for photolithographys with clearance existed. The clearances for manufacturing different width of lines gained from experiments are presented.
广泛应用于微电子加工，光刻技术和扫描显微技术中的聚焦或成像系统中。
It can be used in microelectronic processing, photoetching and scan microscopic focusing or imaging system.
高精度的预对准是设计现代光刻机硅片传输系统需要解决的核心问题之一。
High-precision prealigner is a crucial component in wafer transport device for modern photolithographer.
大视场投影光刻物镜是光学系统中的一种特殊的形式，其设计加工要求高。
The large field projection lithography lens is a special optical lenses form, which put an high demands on the design and processing both for mechanical and optical.
本文探讨了一种可应用于极紫外光刻光学系统的离轴五反射镜系统，它在光学质量、自由工作距离方面满足了极紫外光刻商业化的要求。
A new design of off-axis five mirrors optics was presented which was used to extreme-ultraviolet lithography. It was very suit for the commercialization at optical quality and free work distance.
由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。
All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).
针对基于微压印成形三维MEMS器件制造工艺多层压印的需要，开发了一套基于视频图像对正原理的压印光刻对准系统。
A micron-precision optical alignment system is developed for three-dimensional Micro Electro-Mechanical System(MEMS) device fabrication based on multi-layer imprint lithography.
设计了一种具有方形光斑的新型激光直写系统，用双远心投影透镜组获得方形光斑并以逐点光刻模式运行， 改善了衍射图形光刻质量， 提高了系统运行效率。
In this paper, based on the technique of laser micro-fine cladding and flexibly direct writing, micro-fine conductive lines of high quality and high property are fabricated on glass substrates.
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