通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。
Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.
利用SU -8光刻胶为主要材料，采用多级曝光和电铸金属实现3D结构的工艺技术，研制出了微针执行器的雏形器件。
The rudiments of microneedle actuator have been developed, which is mainly made of SU 8 photoresist, and its 3D construction is fabricated by multistep exposal and electroforming metal.
并且在实验研究的基础上，分析了激光刻蚀金刚石材料的基本规律。
On the basic of theory, experimental studies on laser cutting and polishing diamond film were carried out.
本文介绍了选用优质石英为芯片基体材料的一种制作方法，关键技术包括标准的光刻，湿法腐蚀，键合等微加工技术。
This paper introduces a fabricated method of using fused silica as the chip material. It includes standard photolithography, wet chemical etching and bonding techniques.
光刻胶的旋涂与烘烤，薄膜材料制备。
Photoresist coating preparation and baking; Thin film preparation.
本发明主要涉及浸渍光刻技术的新材料和工艺。
The invention mainly relates to a new material and process for immersion lithography.
由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。
All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).
由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。
All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).
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