早期对化学放大胶的研究主要集中在薄的应用于亚微米光刻的化学放大胶，而很少涉及到对厚的化学放大胶的建模。
The earlier research has been focused on modeling thin chemically amplified photoresist for submicron lithography and little has been made on modeling thick chemically amplified photoresist.
早期对化学放大胶的研究主要集中在薄的应用于亚微米光刻的化学放大胶，而很少涉及到对厚的化学放大胶的建模。
The earlier research has been focused on modeling thin chemically amplified photoresist for submicron lithography and little has been made on modeling thick chemically amplified photoresist.
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