还确定了典型工艺条件，并用俄歇电子能谱分析了硅化钛膜的组分。
The typical growth condition is also determined. The composition of titanium silicide films is analysed…
这一结论得到了俄歇电子能谱分析的佐证，因为在浸泡过的膜的外层发现有铬的存在。
This conclusion is supported by Auger electron spectroscopy data, which show a chromium uptake in the outer layers of the immersed films.
结合俄歇电子能谱和红外光谱分析膜的微观结构，对薄膜的电子注入特性进行了理论分析与讨论。
The characteristics of the electron_injected film were analyzed and discussed, in terms of the microstructure analyses in the film with the Auger electron spectroscopy and the infrared spectrum.
结合俄歇电子能谱和红外光谱分析膜的微观结构，对薄膜的电子注入特性进行了理论分析与讨论。
The characteristics of the electron_injected film were analyzed and discussed, in terms of the microstructure analyses in the film with the Auger electron spectroscopy and the infrared spectrum.
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