薄膜比块体材料的应变速率低，在同样的应力下应变更加困难。

However, the strain rates in thin films are smaller than those of bulk materials, making the strain more difficult under the same stress.

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本文研究了一种制备高硬度、低内应力、厚度高且热稳定性良好的非晶碳薄膜的方法。

We have developed a new process for building up thick and stable amorphous carbon films with high hardness and low internal stress.

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退火使薄膜的折射率将低，释放膜层中的应力，膜层结构更加致密。

And, the annealing process release the stress of the films, which give the film a higher density.

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退火使薄膜的折射率将低，释放膜层中的应力，膜层结构更加致密。

And, the annealing process release the stress of the films, which give the film a higher density.

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