采用低能X射线对低原子序数泡沫样品进行透射照相,以胶片作为记录介质,对材料密度进行测量。
The density measurement technology of foam material with low atomic number was established by low energy X-ray radioscopy .
B4 c涂层提供了低z(原子序数)和稳定的耐熔表面。
B4C coating can provide low Z and stable refractory surface.
原子序数低的CH薄膜在惯性约束聚变实验用靶的制备中应用很广泛。
Low Z materials such as ch films is useful in ICF targets fabrication.
原子序数低的CH薄膜在惯性约束聚变实验用靶的制备中应用很广泛。
Low Z materials such as ch films is useful in ICF targets fabrication.
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