对利用差谱—二阶导数分光光度法直接测定强干扰基体中微量组分的原理和实验方法进行了探讨。
A new method for determining directly trace component in interfering base by absorbance subtraction -second derivative spectrophotometry is proposed.
对利用差谱—二阶导数分光光度法直接测定强干扰基体中微量组分的原理和实验方法进行了探讨。
A new method for determining directly trace component in interfering base by absorbance subtraction -second derivative spectrophotometry is proposed.
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