利用原子力显微镜、二次离子质谱分析仪和探针，对多晶硅薄膜的高温退火特性进行了实验研究。
An experiment was conducted to study the high-temperature annealing characteristics of polysilicon films using atomic force microscope, secondary ion mass spectroscopy and probe.
实验结果表明，此系统既可用于高灵敏度的静态二次离子质谱分析，也可用于二次离子能谱的研究。
The experimental results show that the system can be used to carry out high sensitivity SIMS work as well as secondary ion energy spectrum studies.
实验结果表明，此系统既可用于高灵敏度的静态二次离子质谱分析，也可用于二次离子能谱的研究。
The experimental results show that the system can be used to carry out high sensitivity SIMS work as well as secondary ion energy spectrum studies.
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