用二次离子质谱测量了注入硼离子的深度分布。
Secondary ion mass spectrometry was used to measure the distribution of implanted depths of boron ions.
飞行时间二次离子质谱（TOF- SIMS）是一种非常灵敏的表面检测技术。
Time-of-Flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications.
此外，两种不同表面状态下的化学成分以及氧化层都通过二次离子质谱测定法进行了分析。
Additionally, chemical composition and thickness of oxide layers, occurring in both studied cases, were analyzed by secondary ion mass spectrometry.
在可以提供所希望的纵向分辨率的损伤技术中，最广泛运用的是二次离子质谱(SIMS)。
Among the destructive techniques able to provide the desired depth resolution the most widely used technique is secondary-ion-mass spectroscopy (SIMS).
实验结果表明，此系统既可用于高灵敏度的静态二次离子质谱分析，也可用于二次离子能谱的研究。
The experimental results show that the system can be used to carry out high sensitivity SIMS work as well as secondary ion energy spectrum studies.
根据实验和实例数据，探讨了二次离子质谱或激光离子探针质谱在分析数据解析须掌握的基本方法。
Based on experiments and the data analysis, the basic method for analyzing SIMS or LIPMS data was discussed.
然后他们从细菌中提取出dna，利用高解析二次离子质谱技术分析了其中的化学组成，发现DNA中也含有砷。
They also separated out the DNA from the bacteria and analyzed its composition using a technique called high-resolution secondary ion mass spectrometry; the isolated DNA contained arsenic.
然后他们从细菌中提取出dna，利用高解析二次离子质谱技术分析了其中的化学组成，发现DNA中也含有砷。
They also separated out the DNA from the bacteria and analyzed its composition using a technique called high-resolution secondary ion mass spectrometry; the isolated DNA contained arsenic.
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