灰度掩模法是一种新的二元光学器件制做方法。
Gray scale mask method is a novel way of fabricating binary optical elements.
所得二元光学器件表面具有多位相的浮雕结构。
The relief surface of the element is of multiphase structure.
基于高斯分布随机信号模型，分析了二元光学器件对输入波面位相畸变的宽容度。
The tolerance of the BOE to the phase distortion with Gauss distribution of the input laser beam and the manufacturing error are analyzed.
借助于二元光学器件的独特性质，系统在仅使用两片锗透镜的情况下得到了接近衍射极限的光学质量。
The designed system benefits from the specialities of binary optical elements and approaches diffraction limitation by use of only two germanium lenses.
本文基于标量衍射理论，建立了简明的对准误差与二元光学器件衍射效率的分析模型，得到了适用于一般位相分布器件的衍射效率的简便实用的计算公式。
Based on the theory of scalar diffraction, an error model is established to investigate the effect of alignment error on the efficiency of binary optics elements.
本文利用微光学技术设计并研制了一种同时具有滤波、分束和成象功能的二元光学全互连器件。
A novel binary optical element, which has the functions of filtering, beam-splitting and imaging, is designed and fabricated.
本文利用微光学技术设计并研制了一种同时具有滤波、分束和成象功能的二元光学全互连器件。
A novel binary optical element, which has the functions of filtering, beam-splitting and imaging, is designed and fabricated.
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