描述了用平面工艺技术研制基于硅多条的两维位置灵敏探测器的制各工艺技术及性能测试初步结果。
The technology and preliminary test results of Si bi-dimension position sensitive detector based on multi-strip structure fabricated by using planar technology were described in this paper.
描述了用平面工艺技术研制基于硅多条的两维位置灵敏探测器的制各工艺技术及性能测试初步结果。
The technology and preliminary test results of Si bi-dimension position sensitive detector based on multi-strip structure fabricated by using planar technology were described in this paper.
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