用X光电子能谱(XPS)和傅里叶变换红外光谱(FTIR)技术分析了薄膜的化学成分。
X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR) were used to study chemical composition.
对于反应溅射，可通过连续改变反应气体流量制得化学成分比连续变化的梯度薄膜。
For reactive sputtering, the gradient films with varying ratio of chemical component can be prepared by changing gas flow rate continuously.
沿垂直膜面俄歇电子（AES）逐层分析证明，优化溅射工艺制备的薄膜化学成分分布均匀。
The results of AES analyses proved that the optimized composition is uniform along the cross-sections of the film.
X射线衍射仪、电子能谱仪、原子力显微镜和椭圆偏振仪等研究薄膜的击穿电压、介电常数、晶体结构、化学成分、表面形貌及薄膜的折射率。
The breakdown voltage, permittivity, crystal structure, composition, surface and refractive index of the thin films were studied by I-V, C-V, XRD, EDS, AFM and elliptical polarization instrument.
X射线衍射仪、电子能谱仪、原子力显微镜和椭圆偏振仪等研究薄膜的击穿电压、介电常数、晶体结构、化学成分、表面形貌及薄膜的折射率。
The breakdown voltage, permittivity, crystal structure, composition, surface and refractive index of the thin films were studied by I-V, C-V, XRD, EDS, AFM and elliptical polarization instrument.
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