试验证明，试样台上的离子流密度及离子与中性粒子的比例是重要的试验参数。
The test proves that the density of ion flowing and the ratio of ions to neutral particles are important testing coefficients.
结果表明，当射频场的频率小于或等于离子等离子体频率时，离子流密度明显地随时间变化。
It has been shown that when the RF frequency is less than the ion plasma frequency, the ion flux density will strongly depend on the time.
计算机模拟结果显示了空心圆管内部、外部及端点表面处的离子流密度分布和注入剂量分布存在很大差异。
Our results indicate that there exist the differences of ion flux and dose among the inner, outer surfaces and the end surface of the bore.
实验结果表明等离子体密度随激光能量的提高而增大，而且激光等离子体的电荷通量大于燃烧流的电荷通量。
The density of plasma rises with increase of laser energy, and the charge flux of plasma is larger than that of combustion flow.
该截面值与离子种类和离子的束流密度密切相关。
The collision cross-section are related to ions species and flux.
介绍了与高密度等离子体工艺相关的模型和数值模拟方法，即连续流和动力学方法。
Methods in modeling and numerical simulation for the high density plasma processing are introduced, namely, continuous and kinetic methods.
重离子冷却存储环中的束流是高密度的等离子体，这样的束流照射物体将得到超高压强。
In cooling storage ring heavy ion beam is plasma of high density. when a big power laser interacted on it, it will get ultra-high temperature.
考察了离子束流密度和基底温度对薄膜性能的影响。
The effect of ion beam flux density and the temperature of Si substrate on the properties of the film was investigated.
用湍流扩散燃烧的简单概率密度函数模型对等离子发生器燃烧流场进行了数值模拟。
Uses turbulence diffuse combustion and simply PDF model to numerical simulation plasma generator combustion flow.
溅射特性研究结果表明：屏极电压和溅射气压对离子束均匀性和束流密度影响显著；
The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
采用五栅网离子能量测量装置和法拉第筒测量了宽束冷阴极离子源的离子能量和离子束流密度。
The ion energy and the density of beam flux of cold cathode ion source were measured by pentagrid probing and Faraday cup.
采用五栅网离子能量测量装置和法拉第筒测量了宽束冷阴极离子源的离子能量和离子束流密度。
The ion energy and the density of beam flux of cold cathode ion source were measured by pentagrid probing and Faraday cup.
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