真空溅射镀膜技术及设备在当今和未来都拥有十分广阔的应用领域和发展前景。
The technology and equipment of the vacuum sputtering coating have the extremely broad application and the development in the future.
用真空溅射镀膜技术在掘进机截齿上镀碳化钛膜，使其硬度明显提高，寿命延长3～5倍。
TiC membrane-plated on the pick of heading machine, the hardness is improved, and the work-life is lengthened for 3~5 times.
真空溅射镀膜设备中加热装置在镀膜时常出现打火现象，本文采用金属屏蔽和外壳接地的方法很好地解决了这一问题。
The heating equipment of vacuum sputter coating apparatus always sparks during sputtering, Using metal-screening and surface earth can solve this problem well.
通过溅射的真空蒸发镀膜使超薄切片机上使用的玻璃刀口上带有一层钨膜。
Glass knives for ultramicrotome were improved by sputter and evaporating coating cut-ting dege with a film of tungsten.
文中介绍采用可编程序控制器改进单机单片磁控溅射真空镀膜机的设计和运行情况。
The design and running state which PLC improved magnetic - control vacuum membrane plate machine has been introduced.
首先提出真空管道自体真空镀膜新概念，采用特殊的阴极靶结构设计成功的解决了长管道内表面直流溅射镀膜的难题。
The new concept of the vacuum pipe sputter self-coating is introduced first, and special cathode target structure is introduced to get favorable coating.
公司专业从事晶闸管可控硅整流器、烤架以及真空镀膜和溅射业务。
The enterprise deyang sunlight electric co. , ltd. has special knowledge within the ranges roasting, thyristor and vacuum coating as well as sputtering.
该薄膜可采用高真空热蒸发、电子束沉积以及溅射等多种镀膜技术制备。
The thin film can be prepared by a plurality of film plating techniques such as high vacuum thermal evaporation, electron beam deposition and sputtering.
并采用高真空磁控溅射镀膜技术将敏感膜溅射在光纤端面、硅片、有机玻璃上。
Using high vacuum magnetron sputtering system, it is coated sensitive film on the optical fiber end face, silicon, glass.
介绍了基于FPGA的太阳能真空集热管磁控溅射镀膜机控制系统的整体设计和工程实现过程。
This paper introduces an integrated design and implementation of the SCS control system based on FPGA.
本设计主要对磁控溅射镀膜机真空室进行改进设计，以改善磁控溅射镀膜的工艺条件。设计内容包括真空室及相关机构设计、计算。
This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.
本设计主要对磁控溅射镀膜机真空室进行改进设计，以改善磁控溅射镀膜的工艺条件。设计内容包括真空室及相关机构设计、计算。
This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.
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