乔布斯展示了iPhone的全新照片曝光系统。
Steve Jobs unveils a new photo exposure system for the iPhone.
指电子束蒸发器或曝光系统。
为满足纳米级电子束曝光系统的要求，设计了高速图形发生器。
The high speed Patten Generator is designed for nanometer E-beam lithography system.
DY 2001a型电子束曝光机是作为实用化的小型曝光系统而研制的。
DY2001A Electron Beam Lithography System (EBLS) is developed as a practical miniature EBLS.
作为实例，给出了作者设计的两个典型的曝光系统光照分布的计算模拟结果。
As examples, the calculating simulation results of two typical systems designed by authors recently are given.
通过分析曝光系统的构成和其中的关键技术，探讨了国内研制相关曝光设备所面临的挑战。
By showing the composition and key technologies of the exposure system, the challenges in development of lithography instrument are discussed.
本文扼要介绍了电子束直写圆片的原理，地形标记的识别，以及电子束曝光系统能识别的圆片标记的制造技术。
In this paper, the principle of electron beam write wafer is discussed briefly distinguish topography mark, and make the technology of wafer mark which is found by the electron beam exposure system.
投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。
Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
颜色空间转化：对曝光系统颜色空间转化的三维查表(3dLUT)和人工神经网络(ANN)方法进行了研究。
Color space conversion: The color space conversion with three-dimensional lookup table (3d LUT) method and artificial neural network (ANN) method is studied.
摘要：投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。
Abstract: Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
介绍了将商用透射电镜JEM- 2000 EX改造为高能电子束曝光系统的研制工作，在现阶段研制工作的基础上进行了曝光实验。
The research work about modifying a commercial transmission electron microscope (JEM-2000EX) into a lithography system is introduced, and the experiments are carried out on this system.
取景器盖能防止由于离散光进入取景器目镜而引起不正确的曝光。它能保证测光系统完全不受影响。 收藏。
The viewfinder cap is used to avoid incorrect exposure due to stray light which may enter the metering system is not adversely affected.
取景器盖能防止由于离散光进入取景器目镜而引起不正确的曝光。它能保证测光系统完全不受影响。 收藏。
The viewfinder cap is used to avoid incorrect exposure due to stray light which may enter the metering system is not adversely affected.
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