High frequency plasma technology is widely used in preparing nano materials, however study papers reported on HF-Plasma reactor is seldom.
高频等离子体技术已经广泛应用于纳米材料的制备，但是有关高频等离子体反应器分析的研究论文较少。
参考来源 - 高频等离子制备纳米微粒反应器的分析·2,447,543篇论文数据，部分数据来源于NoteExpress
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperatures (T_s).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
本文研究了磁流体力学与高频等离子体波(包括纵横模式)之间的精巧的相互作用。
The subtle interactions between magnetohydrodynamics and high-frequency plasma waves involving transverse and longitudinal modes are investigated.
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