结果表明制备的碳膜是一种具有纳米石墨结构的非晶碳膜。
The results showed that the films are a-C films with nano-graphite structure.
碳颗粒包括非膨化石墨和膨化石墨二者的混合物。
The carbon particles include a blend of both non-expanded graphite and expanded graphite.
利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。
Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.
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