接近式光刻中一般采用柯勒照明系统，并采用蝇眼透镜形成多点光源均匀掩模面的光场分布。
Kohler illumination was used in proximity lithography, and a flys eye lens was adopted to form multi-point source in order to uniform the light intensity on the mask plane.
同时针对实际光源的计算机建模进行了阐述 ，给出了蝇眼透镜阵列照明系统的设计方法和设计实例。
This paper also explicates the computer modeling based on the actual light source, and presents the design method and cases.
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